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SUMMARY:Online workshop: "Nanoengineering: Lithography and Patterning"
DTSTART:20211210T130000
DTEND:20211210T171500
DTSTAMP:20260411T033629Z
UID:508140fc2879c85c7c5af0f1a09a6daee89cf28b3b6e2d33a718dfe6
CATEGORIES:Conferences - Seminars
DESCRIPTION:Daniel Spemann\, Paul Räcke et al\, Leibniz Institute of Surf
 ace Engineering (IOM)\, Leipzig\, Germany  Jordi Llobet\, Francesc Perez-
 Murano et al\, IMB-CNM CSIC\, Barcelona\, Spain  Dominique Mailly\, Andre
 a Cattoni\, C2N-CNRS\, Paris\, France  Anette Löfstrand et al\, Lund Uni
 versity\, Lund\, Sweden  Ana Conde-Rubio\, Juergen Brugger\, et al\, EPFL
 \, Lausanne\, Switzerland  Ivan Maximov\, Reza Jafari Jam et al\, Lund Un
 iversity\, Lund\, Sweden \nThis workshop serves as a platform for interac
 tion and exchange of ideas between members of the Joint Activity ”Nano-E
 ngineering and pattern transfer methods” of NFFA-Europe Pilot (NEP) proj
 ect and the invited external participants. Its scope includes presentation
 s and discussions of advanced approaches of ultra-high resolution lithogra
 phy and methods of patterns transfer. Of special interest are nanofabricat
 ion techniques that can be used in quantum technologies\, but further deve
 lopments and innovative aspects of generic technologies\, such as electron
 - and ion-beam lithography\, scanning probes\, self-assembly\, etching\, d
 eposition\, are of interest\, too. \n\nhttps://www.nffa.eu/news/project-u
 pdates/pilot-nep/\n\nSchedule:\n\n	13.00 – 13.10: Welcome and Introducti
 on\n	13.10 – 13.40: INVITED. Development of Deterministic Ion Implantati
 on for Applications in Quantum Technologies\, Daniel Spemann\, Paul Räcke
  et al\, Leibniz Institute of Surface Engineering (IOM)\, Leipzig\, German
 y \n	13.40 – 14.00: Silicon Nanowires with Quantum Dot as a Platform fo
 r experimentation in Quantum Tecnologies\, Jordi Llobet\, Francesc Perez-M
 urano et al\, IMB-CNM CSIC\, Barcelona\, Spain \n	14.00 – 14.20: Focuse
 d beams patterning of metal-oxides synthesized by Polymer Assisted Deposit
 ion\, Dominique Mailly\, Andrea Cattoni\, C2N-CNRS\, Paris\, France \n	14
 .20 – 14.30: Break \n	14.30 – 14.50: Block copolymer lithography for 
 feature reduction and sub-10 nm patterning\, Anette Löfstrand et al\, Lun
 d University\, Lund\, Sweden  14.50 – 15.10: Unconventional patterning 
 by nanostencils and thermal scanning probes\, Ana Conde-Rubio\, Juergen Br
 ugger\, et al\, EPFL\, Lausanne\, Switzerland \n	15.10 – 15.30: Post Tr
 eatment Processing for High-Resolution Displacement Talbot Lithography\, I
 van Maximov\, Reza Jafari Jam et al\, Lund University\, Lund\, Sweden \n	
 15.30 – 15.40: Break\n	15.40 – 17.15: Free discussion. Conclusions. \
 n
LOCATION:https://lu-se.zoom.us/j/63703855859?pwd=UzYzeEpUSVIxM3VNSmg4WGlYc
 nNNdz09
STATUS:CONFIRMED
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