BEGIN:VCALENDAR VERSION:2.0 PRODID:-//Memento EPFL// BEGIN:VEVENT SUMMARY:Prof. Michael Tsapatsis : Reaction Engineering Principles of Elect ron-Induced Transformations in Metal-Organic Thin Films and their Use in M embrane and Micro-chip Manufacturing DTSTART:20251010T161500 DTEND:20251010T173000 DTSTAMP:20260511T213517Z UID:e542569cb4be8f1e9c9728966abf0971143438559bc3b79c675d2709 CATEGORIES:Conferences - Seminars DESCRIPTION:Prof. Michael Tsapatsis\, \nDpt of Chemical and Biomolecular Engineering\, \nJohns Hopkins University (JHU)\,\nBaltimore\, USA\nAbstra ct : This talk will motivate and address the question of how to harness lo w-energy-electron-induced chemistry in amorphous zeolitic imidazolate fram eworks (aZIFs) (a type of MOF) to realize fully dry\, high-resolution li thography and generate novel nanostructured materials for advanced manufac turing and separations. Low-energy electrons (<100 eV)\, produced directl y by electron beams or indirectly through extreme ultraviolet and beyond e xtreme ultraviolet (EUV/BEUV) irradiation\, induce chemical changes in sol ids. These changes can be viewed as irreversible damage to these materials \, but they can also be viewed as a way to controllably modified ZIF chemi stry and structure. In 2018\, we were first to report that ZIFs undergo el ectron-induced solubility changes enabling patterning. We later measured l ow-energy electron-induced radiolytic reaction rates of imidazoles\, and s howed that exposure to electrons transforms ZIF films into cyano-zinc thin films with altered and sometimes enhanced separation performance. Buildin g on this reactivity\, we developed an all-dry resist platform based on am orphous ZIF films grown by atomic/molecular layer deposition (ALD/MLD). Pa tterning is achieved through electron or EUV/BEUV or other irradiation tha t can generate low-energy electrons\, followed by vapor-phase\, non-plasma etching that complexes zinc and volatilizes imidazole\, eliminating liqui d developers. This approach enables nanoscale patterns with high fidelity and reduces the environmental footprint of lithographic processing. More r ecently\, based on a ZIF thin film formation approach introduced by EPFL\, using ultra-dilute precursor solutions\, we extended wafer-scale ZIF depo sition methods to include spin-coated ZIF films\, achieving promising perf ormance for EUV and BEUV lithography. These advances establish a versatile materials-chemistry toolkit where electron-stimulated reactions are coupl ed with mass transport to fabricate functional nanostructures. The present ation will highlight underlying mechanisms\, process innovations\, and pot ential applications in microelectronics and membrane technologies.\n\nBio : Michael Tsapatsis is a Bloomberg Distinguished Professor of Chemical an d Biomolecular Engineering at Johns Hopkins University (JHU) with a joint appointment in the Applied Physics Laboratory. Before joining JHU (Septemb er 1\, 2018) he was on the faculty of the Department of Chemical Engineeri ng and Materials Science at the University of Minnesota since September 20 03 where he held the Amundson Chair and the McKnight Presidential Endowed Chair. Before joining the University of Minnesota\, he was a faculty membe r in the Chemical Engineering Department at the University of Massachusett s Amherst (1994-2003). He received an Engineering Diploma (1988) from The University of Patras\, Greece\, and MS (1991) and Ph.D. (1994) degrees fro m the California Institute of Technology (Caltech) working with G.R. Gaval as. He was a post-doctoral fellow with M.E. Davis at Caltech (1993/94). Hi s research group’s accomplishments include development of hierarchical m esoporous zeolite catalysts\, oriented molecular sieve films\, 2D zeolites \, molecular sieve/polymer nanocomposites for membrane applications\, crys tal structure determination of adsorbents that are now used in a commercia l process\, and synthesis of precisely sized oxide nanoparticles that have been commercialized. In the last decade\, he is developing novel uses of metal-organic thin films for applications in the microelectronics industr y as resists for lithography. He was elected to the US National Academy o f Engineering (2015) for contributions to the “design and synthesis of z eolite-based materials for selective separation and reaction.” He co-au thored the 2019 National Academies Report “A Research Agenda for a New E ra in Separations Science” and he currently serves an Associate Editor f or Science Advances. He has mentored over 100 Ph.D. students and post-do ctoral fellows and has taught courses in reaction engineering\, catalysis\ , separations\, transport phenomena\, and process design with emphasis on energy efficiency and process intensification.\n  LOCATION:Tseuzier https://plan.epfl.ch/?room==I17%204%20K2 https://epfl.zo om.us/j/65378030944 STATUS:CONFIRMED END:VEVENT END:VCALENDAR