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SUMMARY:NanoFrazor Workshop - Advancing Parallel Nanolithography with Deca
 pede Technology
DTSTART:20260428T093000
DTEND:20260428T160000
DTSTAMP:20260416T081206Z
UID:834b6356f9ae78532200fc7c7fd23b8eca72df85029e9636c9773403
CATEGORIES:Conferences - Seminars
DESCRIPTION:Dr. Antoaneta Damyanova\, Head of Software\, Heidelberg Instr
 uments Nano\nProf. Dr. Jürgen Brugger\, Microsystems Laboratory 1 (LMIS1
 )\, EPFL\nEliott Clerc\, R&D Engineer\, Heidelberg Instruments Nano\n\nMo
 re to come\nJoin us on April 28 for a focused workshop on advanced nanoli
 thography with the NanoFrazor\, a high-resolution thermal scanning probe
  lithography platform. The event will showcase the latest Decapede techn
 ology\, featuring 10 parallel writing tips for significantly increased th
 roughput without compromising nanoscale precision.\n\nThe morning session
  will include expert talks from the CTO and engineering team at  Heidelb
 erg Instruments Nano\, alongside Prof. Jürgen Brugger and researchers fr
 om the hosting laboratory. Guest speakers will present recent results an
 d application insights enabled by the NanoFrazor. Following a joint lunc
 h\, the afternoon session will offer live tool demonstrations\, in-depth
  technical discussions\, and direct interaction with application and tec
 hnology experts.
LOCATION:BM 1130 https://plan.epfl.ch/?room==BM%201130
STATUS:CONFIRMED
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