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VERSION:2.0
PRODID:-//Memento EPFL//
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SUMMARY:"A grid reactor with low ion bombardment energy for large area PEC
 VD of thin film silicon solar cells"
DTSTART:20130204T103000
DTEND:20130204T113000
DTSTAMP:20260506T195427Z
UID:722851b8affeca97a58b07a1c0102b127986e3a13c09aa740c9a0fbb
CATEGORIES:Conferences - Seminars
DESCRIPTION:Dr. Michael Chesaux\, CRPP-EPFL\nThis study presents the devel
 opment of a Plasma Enhanced Chemical Vapor Deposition (PECVD) reactor for 
 the deposition of large area thin film silicon solar cells. The aim is to 
 reduce the ion energy bombardment inherent in RF capacitively-coupled para
 llel-plate reactors conventionally used to deposit these solar cells. This
  ion bombardment could cause defects in silicon layers and deteriorate ele
 ctrical interfaces.\nThe reduction of this ion energy bombardment is obtai
 ned by using localized remote plasma in a grid electrode inserted in the p
 arallel-plate reactor. The plasma mechanisms responsible for the low ion b
 ombardment energy in this novel reactor are the self-bias potential and a 
 non sinusoidal plasma potential waveform. These mechanisms are measured wi
 th a wide range of complementary plasma diagnostics (Langmuir probes\, ret
 arding field energy analyzer\, phase resolved optical emission Spectroscop
 y\, capacitive probe) and are supported by a numerical fluid simulation.
LOCATION:PPB 019
STATUS:CONFIRMED
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