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SUMMARY:Probe nanopatterning: towards a smarter lithography technology
DTSTART:20120119T110000
DTSTAMP:20260511T125406Z
UID:50eda806189e09b208290f019120c05928c90db769cc9109b26e5cea
CATEGORIES:Conferences - Seminars
DESCRIPTION:Dr. Michel Despont\, IBM Research - Zurich\nAt IBM\, we have d
 eveloped an ML2 technology based on Scanning Probe Lithography (SPL) with 
 in-situ metrology offering a path to a closed-loop lithography concept. It
  is based on the local evaporation of a resist by using a heated probe. We
  have demonstrated the potential of the technology by achieving 15-nm half
 -pitch patterning and\, thanks to its metrology capability\, a lithography
  turnaround time that is shorter than that of e-beam lithography. Moreover
 \, owing to its inherent simplicity\, the technology is much better adapte
 d to massive parallelization to meet the throughput required for ML2. Fina
 lly\, the technology opens up new perspectives in nanopatterning as it als
 o allows the patterning of complex 3D nanostructures. In this presentation
 \, Dr. Despont will introduce the lithography landscape and its challenges
  before describing our probe-patterning method and putting it into perspec
 tive with other NGL and SPL technologies. Its unique features open a path 
 toward a smarter way of doing lithography\, with greater control of the pr
 ocess\, lower cost\, higher versatility and new applications.\n 
LOCATION:MEB010 
STATUS:CONFIRMED
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