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SUMMARY:Colors in thin film materials: from interference in insulators to 
 interstitials in intermetallics
DTSTART:20141006T131500
DTEND:20141006T141500
DTSTAMP:20260511T062141Z
UID:1753de9f2b13dec3e78b894c9da60a4e029bcac789e6f0cb867f6906
CATEGORIES:Conferences - Seminars
DESCRIPTION:Prof. Ralph Spolenak\, ETH Zürich\, Department of Materials\n
 Colors are the first thing we can appreciate about a material\, usually be
 fore we even touch it or in a more sophisticated manner investigate it mic
 roscopically. This talk will investigate how the microstructure\, the arch
 itecture and the chemistry of a thin film material influences its interact
 ion with photons in the visible energy range. Examples will be given from 
 all materials classes and the phenomena of interference (strong and "weak
 ”) and band structure induced colors will be described. Applications wil
 l be given in the biomedical field and although many of the concepts can b
 e related to optics\, esthetics and even fraud detection. Briefly\, other 
 application-driven properties of coatings will be addressed\, which range 
 from fracture toughness over wear resistance\, to electrochemical stabilit
 y. The limits of strength will also be explored in semiconductors and meta
 ls.\nPapers:\n- Applied Physics Letters 103\, 213112 (2013)\; doi: 10.1063
 /1.4833537\n- Nature Materials DOI: 10.1038/NMAT3443\n- Acta Materialia 61
  (2013) 2874–2883\n- CCC 0361 -231 7/07/01 0004-23$04.00 COLOR research 
 and application\nBio: Ralph Spolenak has been promoted to tenured Associat
 e Professor on June 1st\, 2010 after a term as Assistant Professor (Tenure
  Track) and Chair of the Laboratory for Nanometallurgy starting October 1s
 t\, 2004. He is currently serving as the chairman of the board of Scientif
 ic Center for Optical and Electron Microscopy (ScopeM) .\nProf. Spolenak w
 as born August 17\, 1971 in Wels\, Austria. He studied physics at the Tech
 nical University of Vienna\, Austria. After completing his diploma thesis 
 in the field of solid state physics in 1995\, and a brief research term at
  the University of Pavia\, Italy\, he moved to Stuttgart\, Germany\, to co
 mmence his PhD work at the Max-Planck-Institute for Metals Research and th
 e University of Stuttgart. In 1999 he completed his dissertation on Alloyi
 ng effects in electromigration and was subsequently awarded the Max Planck
  Society's Otto Hahn medal for his achievements during his thesis.\nIn 199
 9 Prof. Spolenak was hired as a Postdoctoral Member of Technical Staff at 
 Bell Laboratories\, Lucent Technologies in the USA. There he was working o
 n the mechanical properties of thin metal films. During this time he becam
 e a member of the principal research team to establish the first dedicated
  Laue microdiffraction beamline at the Advanced Light Source\, Lawrence Be
 rkeley National Laboratories. After a year as a visiting scientist at Lehi
 gh University in Pennsylvania\, he returned to the Max-Planck-Institute in
  2002 to serve as a group leader in the department of Prof. E. Arzt.\nThe 
 main research interests of Prof. Spolenak's group are the mechanical prope
 rties of metals at the nanoscale and how these properties can be influence
 d by metallurgical approaches. The combination of testing\, characterizati
 on and modeling are essential for making significant advances in this fiel
 d. This comprises the development of new\, mostly synchrotron based\, in s
 itu testing methods that allow for analysis at the nanoscale.
LOCATION:MXF 1 https://plan.epfl.ch/?room==MXF%201
STATUS:CONFIRMED
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