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SUMMARY:Study on the PECVD deposited amorphous and nanostructured silicon 
 carbon films
DTSTART:20090619T110000
DTSTAMP:20260929T042748Z
UID:b33703d116e0822803623e25b82ed2ba44b9e3ed81d472ed6e73dfcb
CATEGORIES:Conferences - Seminars
DESCRIPTION:Dr K Basa\nABSTRACT\nAmorphous and nanostructured silicon carb
 on films have generated considerable interest both fundamentally and techn
 ologically because of their current and future applications in microelectr
 onic and optoelectronic devices.Although interesting class of materials su
 ch as amorphous\, microcrystalline and nanocrystalline materials have been
  deposited using PECVD technique under suitable preparation conditions\, t
 he interesting issues like microstructural and overall disorder\, chemical
  ordering\, medium range ordering as well as microcrystalline to nanocryst
 alline phase transition have not been well studied.In the present talk I w
 ill summarize the interesting results obtained from our study on PECVD dep
 osited amorphous and nanostructured silicon carbon films concerning these 
 issues.
LOCATION:IMT Neuchâtel\, PVLAB\, Breguet 2 / Salle MT2 11.00-12.00
STATUS:CONFIRMED
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