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SUMMARY:Thin films of metal-organic frameworks: The search for new deposit
 ion methods and applications
DTSTART:20160929T160000
DTEND:20160929T170000
DTSTAMP:20260930T185332Z
UID:cd47d68a1b57c2a09ddec26e2003429312a7dc7220e669d0ee9ea676
CATEGORIES:Conferences - Seminars
DESCRIPTION:Prof. Ameloot Rob\nCenter for Surface Chemistry and Catalysis\
 , KU Leuven\, University of Leuven\, Belgium\nMetal-organic frameworks (MO
 Fs) are an intriguing class of porous crystalline materials with record in
 ternal surface areas. There is tremendous potential for integrating MOFs i
 nto microelectronics\, e.g. as active sensor coatings\, low-k dielectrics 
 and tunable conductors. A key enabling step in leveraging the properties o
 f MOFs in microelectronics will be the development of robust thin film dep
 osition methods. Thus far\, typical procedures for the deposition of MOF t
 hin films are incompatible with microelectronic fabrication because of cor
 rosion and contamination issues.\n\nWe recenty demonstrated chemical vapor
  deposition (CVD) of MOF thin films (Nat Mater 2016\, 15\, 304-310). The M
 OF-CVD process allows conformal growth of thin films and extends MOF proce
 ssing to one of the most commonly used techniques in thin film research an
 d manufacturing. Two important challenges were tackled to realize this pro
 cess: vapor phase supply of precursors and crystallization at the vapor-so
 lid interphase. To our knowledge\, this is the first vapor phase process f
 or conformal film deposition of a crystalline and microporous network mate
 rial. Potential applications of MOF-CVD coatings will be discussed.
LOCATION:Zeuzier https://www.google.com/maps/place/EPFL+Valais+Wallis/?ref
 =zeuzier
STATUS:CONFIRMED
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