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VERSION:2.0
PRODID:-//Memento EPFL//
BEGIN:VEVENT
SUMMARY:Measurements of Substrate Surface Potentials during Plasma Process
 ing
DTSTART:20090303T163000
DTSTAMP:20260511T085622Z
UID:c456b382ecdcf2c003d6ed8c9b8fd4dae68e36112de31ab3a03a4773
CATEGORIES:Conferences - Seminars
DESCRIPTION:Dr. Steve Savas\, Plasma Si Inc.\, Fremont\, California\, USA\
 nMeasurement during processing of the variation of the surface potential a
 nd worst case potential difference across any surface dielectric layer or 
 surface conducting layer.
LOCATION:Rue A.-L. Breguet 2\, Neuchâtel\, MT2
STATUS:CONFIRMED
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END:VCALENDAR