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SUMMARY:Applications of Atomic Layer Deposition in Solar Fuel Synthesis
DTSTART:20170717T111500
DTEND:20170717T121500
DTSTAMP:20260924T120607Z
UID:0eb421d40ac12c3e0fa288ed2484b61070a9fa8325ac88c01df8a47b
CATEGORIES:Conferences - Seminars
DESCRIPTION:Paul C. McIntyre - Department of Materials Science and Enginee
 ring - Stanford University Bio : Paul McIntyre is Rick and Melinda Reed Pr
 ofessor in the School of Engineering\, Babitha Karkera Chair of the Depart
 ment of Materials Science and Engineering and Senior Fellow of the Precour
 t Institute for Energy at Stanford University.  He was previously a membe
 r of the technical staff of the central research laboratories of Texas Ins
 truments\, and was a Director’s-Funded Postdoctoral Fellow at Los Alamos
  National Laboratory.  At Stanford\, McIntyre leads a research team of gr
 aduate students\, postdoctoral researchers and adjunct professors who perf
 orm basic studies of nanostructured inorganic materials for applications i
 n electronics and energy technologies.  He is best known for his work on 
 metal oxide/semiconductor interfaces\, functional metal oxide thin films\,
  atomic layer deposition\, and semiconductor nanowires.  McIntyre is an a
 uthor of approximately 220 archival journal papers and an inventor of 8 US
  patents.  He has given over 120 invited presentations\, plenary talks an
 d tutorial lectures on these topics.  He has received two IBM Faculty Awa
 rds\, a Charles Lee Powell Foundation Faculty Scholarship and an SRC Inven
 tor Recognition award.  McIntyre was a GCEP Distinguished Lecturer in 201
 0 and received the Woody White Award of the Materials Research Society in 
 2011.  In 2016\, he was the inaugural Colorado School of Mines/NREL Mater
 ials Science Distinguished Lecturer. \nAbstract : Atomic layer deposition
  (ALD)\, a cyclic form of chemical vapor deposition which occurs via a ser
 ies of self-limiting chemisorption reactions\, is increasingly used in fab
 ricating microelectronic devices because of its remarkable potential for d
 epositing a very wide range of thin films of well-controlled thickness and
  uniformity over a large variety of substrates.  Exciting applications of
  ALD in energy technologies have also emerged in recent years\, particular
 ly in photovoltaics and micro-fabricated solid oxide fuel cells.  In this
  presentation\, I will summarize recent research in which ALD has been use
 d to prepare stable photoelectrodes for efficient solar-driven water split
 ting to create hydrogen fuel.  ALD-grown TiO2 layers are found to be part
 icularly effective in inhibiting oxidative corrosion of high-quality semic
 onductor absorbers and in electronically coupling these semiconductors to 
 efficient catalysts for oxygen evolution\, the kinetically-limiting step i
 n water splitting.  This talk will describe factors influencing the elect
 ronic conductivity of ALD-TiO2\, and design principles for optimizing the 
 photovoltage of these protected semiconductor junctions.   Atomic layer d
 eposition of TiO2-transition metal oxide alloy layers that can function as
  efficient oxygen evolution catalyst layers and high work function Schottk
 y contacts for water splitting photoanodes will also be reported.\n 
LOCATION:SV 1717 https://plan.epfl.ch/?room==SV%201717
STATUS:CONFIRMED
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