BEGIN:VCALENDAR
VERSION:2.0
PRODID:-//Memento EPFL//
BEGIN:VEVENT
SUMMARY:NanoFrazor lithography
DTSTART:20170830T114500
DTEND:20170830T130000
DTSTAMP:20260407T172744Z
UID:fb508de03d4fe1714e9a3e2cf5fd10452fa2c59e59660b8abd7571c2
CATEGORIES:Conferences - Seminars
DESCRIPTION:Dr. Felix Holzner\, CEO and co-founder of SwissLitho AG\nBio:\
 n\nFelix Holzner studied physics in New Zealand and Germany and received a
  PhD from ETH Zurich.\n\nIn 2009\, he joined the Nanofabrication Group at 
 the IBM Research Laboratory in Zurich where he started to work on Thermal 
 Scanning Probe Lithography. After several technological breakthroughs\, Fe
 lix shortened the name of the technology to “NanoFrazor” and founded S
 wissLitho in 2012 with the clear vision to enable superior nanofabrication
  for everyone. He strongly believes that the unique capabilities of the Na
 noFrazor enable new science and eventually even products not conceivable t
 oday.\n\nFelix has a complete overview over all possible nanolithography t
 echnologies and a very deep understanding of the NanoFrazor technology and
  its applications. He is a regular invited speaker at international confer
 ences. Felix received the IBM Plateau Invention Achievement Award and the
  ETH Pioneer Fellowship in 2012 and 2013\, respectively. With SwissLitho a
 nd the NanoFrazor\, he won numerous of the most prestigious startup and te
 chnology awards exceeding prize money of 500’000 CHF. In 2013\, he was p
 art of the Swiss national startup team in the ventureleaders program in Bo
 ston and recently received a scholarship for the Advanced Management Progr
 am at the University of St. Gallen (HSG).\nThermal scanning probe lithogra
 phy (t-SPL) has recently entered the lithography market as first true alte
 rnative or extension to electron\nbeam lithography (EBL). The first dedica
 ted t-SPL systems\, called NanoFrazor\, have been installed at research fa
 cilities in Europe\, America\,\nAsia and Australia by the company SwissLit
 ho\, a spinoff company of ETH Zurich.\n\nCore of the technology - which ha
 s its origins at IBM Research and their Millipede project - is a heatable 
 ultra-sharp probe tip which is used\nfor patterning and simultaneous inspe
 ction of complex nanostructures. The heated tip creates arbitrary depth\, 
 high-resolution (<10 nm\nhalf-pitch) nanostructures by local evaporation o
 f resist materials. Using an integrated in-situ metrology method\, the pat
 terning depth can\nbe controlled with 1 nm accuracy. This enables patterni
 ng of extremely accurate 3D nanostructures in a single step without wet\nd
 evelopment. The patterning speed is comparable to high resolution EBL.\n\n
 The application range for this new nanofabrication capability is broad and
  will be demonstrated with a selection of examples.\nApplications that are
  enabled by the nm-precise 3D patterning include 3D phase plates and finel
 y tuned coupled Gaussian optical\nmicrocavities. Furthermore\, 3D shaped n
 anofluidic confinements have been used to precisely control the movement o
 f nanoparticles and\nnanowires.\n\nThe high resolution 2D capability was a
 pplied e.g. to shape complex plasmonic structures. Furthermore\, several s
 uperior nanoelectronic\ndevices will be shown. Such devices are predominan
 tly made from randomly dispersed nanowires or 2D materials. Therefore\, th
 ey benefit\nstrongly from the unique markerless overlay capability of the 
 NanoFrazor lithography\, but also from the fact that actually no charged\n
 particle beam is used during lithography\, which can often damage sensitiv
 e materials.\n\nFinally\, a few examples are shown\, how the heated tips a
 re also used for direct modification of surfaces by triggering local phase
  changes\nor a chemical reactions.
LOCATION:BM 3101 https://plan.epfl.ch/?room=BM3101
STATUS:CONFIRMED
END:VEVENT
END:VCALENDAR