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SUMMARY:EUV lithography and metrology for more Moore
DTSTART:20190128T090000
DTEND:20190128T100000
DTSTAMP:20260510T202458Z
UID:194208ee073e0f30746a21d0093d181ffc18dc905252b05a5a61d355
CATEGORIES:Conferences - Seminars
DESCRIPTION:Yasin Ekinci \nThe tremendous shrinkage of the semiconductor d
 evices in the last five decades\, as predicted by Moore’s law\, has chan
 ged our daily lives. This progress was possible through advancements in ph
 otolithography and optical metrology. Extreme ultraviolet (EUV) lithograph
 y at 13.5 nm wavelength is the manufacturing method for high-volume semico
 nductor manufacturing at 7 nm technology node and below. To enable future 
 progress\, many challenges lie ahead. In my talk\, I discuss the challenge
 s of nanolithography\, mask inspection\, and wafer metrology and show how 
 to overcome these by using new concepts such as resistless lithography and
  lensless imaging.\nShort bio : \nYasin Ekinci is head of the Advanced Lit
 hography and Metrology group at Paul Scherrer Institute. He obtained his P
 hD in Max-Planck Institute for Dynamics and Self-Organization\, Göttingen
 \, Germany in 2003. In 2004\, he joined Paul Scherrer Institute as a postd
 octoral researcher. Between 2006 and 2012 he worked as a postdoctoral rese
 archer and subsequently as a senior scientist and a lecturer in Department
  of Materials at ETH Zürich. He is at PSI since 2009 working on various t
 opics of nanoscience and technology\, including EUV lithography\, resist m
 aterials\, lensless imaging\, plasmonics\, semiconductor nanostructures\, 
 and nanofluidics. He is author/co-author of about 180 papers and 5 patent 
 applications. He is a fellow of SPIE.\n\n 
LOCATION:MED 2 1124 https://plan.epfl.ch/?room=MED21124
STATUS:CONFIRMED
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