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SUMMARY:IMT Talk - Advancing the nanolithography for more Moore and beyond
DTSTART:20210125T130000
DTEND:20210125T140000
DTSTAMP:20260511T050349Z
UID:e0f78400c4cca509ebe648c06a11f41d211298931fdaedd8a22c63b9
CATEGORIES:Conferences - Seminars
DESCRIPTION:Dr. Yasin Ekinci\nThe tremendous shrinkage of the semiconducto
 r devices in the last five decades\, as predicted by Moore’s law\, has c
 hanged our daily lives. This progress was possible through advancements in
  photolithography and optical metrology. Extreme ultraviolet (EUV) lithogr
 aphy at 13.5 nm wavelength is the manufacturing method for high-volume sem
 iconductor manufacturing at 7 nm technology node and below. To enable futu
 re progress\, many challenges lie ahead. In my talk\, I discuss the challe
 nges of nanolithography with specific examples. Moreover\, it is evident t
 hat the progress of classical computing will come to an end\, and therefor
 e\, we need a paradigm change. Fortunately\, quantum computing is emerging
  as a technology that will ensure progress in computing beyond Moore’s l
 aw. I will talk about the lithographic challenges  of quantum computing a
 nd present our ongoing work to address these.\n\nBio:\nYasin Ekinci is the
  head of the Laboratory for Micro and Nanotechnology (LMN). He also heads 
 the Advanced Lithography and Metrology Group at Paul Scherrer Institute. H
 e received his Bachelor's degree in Physics at Middle East Technical Unive
 rsity\, Ankara\, Turkey\, in 1997\; his Master's degree in Engineering Sci
 ences at the University of De Montfort\, Leicester\, UK\, in 1999. He obta
 ined his Ph.D. in Max-Planck Institute for Dynamics and Self-Organization\
 , Göttingen\, Germany\, in 2003. In 2004\, he joined Paul Scherrer Instit
 ute as a postdoctoral researcher. Between 2006 and 2012\, he worked as a p
 ostdoctoral researcher and subsequently as a senior scientist and a lectur
 er in the Department of Materials at ETH Zürich. Since 2009\, he works at
  PSI as a senior scientist\, and in 2016 he was appointed as the head of t
 he Advanced Lithography and Metrology group. Since 2018\, he is the acting
  head of the Laboratory for Micro and Nanotechnology.\n\nHe worked on vari
 ous topics of nanoscience and technology\, including atom optics\, surface
  science\, EUV lithography\, resist materials\, coherent scattering\, lens
 less imaging\, plasmonics\, metamaterials\, biosensing\, semiconductor nan
 ostructures\, and nanofluidics. He is author/co-author of more than 200 
 papers\, 3 book chapters\, and 7 patent applications. He received Young i
 nvestigator of the year award of Swiss Society for Optics and Microscopy i
 n 2009. He is a fellow of SPIE.\n 
LOCATION:By ZOOM https://epfl.zoom.us/j/85372904595?pwd=WFNCRElEQkRoYzVheT
 VRR2p6MEI2Zz09
STATUS:CONFIRMED
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