Exotic properties and emergent functionalities of chalcogenide Mott insulators AM4Q8
Event details
| Date | 27.04.2018 |
| Hour | 15:15 |
| Speaker | Laurent Cario Institut de Matériaux Jean Rouxel (IMN) Nantes, France |
| Location | |
| Category | Conferences - Seminars |
The AM4Q8 (A = Ga, Ge; M = V, Nb, Ta, Mo; Q = S, Se) compounds represent a family of narrow gap Mott insulators with very interesting electronic properties. These compounds exhibit a lacunar spinel structure with tetrahedral transition metal clusters M4 [1]. Compare to most other inorganic Mott insulators, the AM4Q8 compounds show very small Mott-Hubbard gap (0.1-0.3 eV) as the electronic repulsion occurs on the scale of these tetrahedral clusters and not on the scale of single atoms [2]. As a consequence these compounds show a great variety of ground states and astonishing electronic properties depending on clusters filling, compression or distortion. GeV4S8 for example exhibit a multiferroic behaviour related to an orbital ordering on the clusters [3]. GaTa4Se8 and GaNb4Se8 undergo a bandwidth-control Insulator to Metal Transition (IMT) and superconductivity when placed under external pressure [2, 4]. The substitution of V per Ti in the GaV4S8 leads to an IMT driven by disorder on the clusters and to the emergence of a half ferromagnetic metal [5]. While chemical doping of the ferromagnetic Mott insulator Ga1-xGexV4S8 leads to a bulk, colossal and negative magnetoresistance that may be understood on the basis of the cluster distortion at low temperature [6]. Finally, the AM4Q8 compounds reveal a striking resistive switching above a threshold electric field of a few kV/cm which is related to the breakdown of the Mott insulating state at the nanoscale [7]. This phenomenon opens new functionalities that may be employed to build up a new type of Resistive Random Access Memory (RRAM) [8] or an artificial neurons [9].
References:
[1] Ben Yaich, H. et al. (1984) J. Less-Common Met. 102, 9;
[2] Abd-Elmeguid, M. M. et al. (2004) Phys. Rev. Lett. 93, 026401; Ta Phuoc, et al. (2013) Phys. Rev. Lett., 110 (3), 037401. Jeong, M. Y. et al. (2017) Nature Commun. 10.1038/s41467-017-00841-9
[3] Singh, K. et al. (2014) Phys. Rev. Lett. 113 (13), 137602.
[4] Pocha, R. et al. (2005) J. Am. Chem. Soc. 127, 8732; Camjayi, A et al. (2014) Phys. Rev. Let., 113 (8), 086404.
[5] Vaju, C. et al. (2008) Chem. Mater. 20, 2382; Dorolti, E. et al. (2010) J. Am. Chem. Soc. 132, 5704
[6] Janod, E. et al. (2015) Chemistry of Materials, 27 (12), 4398.
[7] Janod, E. et al. (2015) Adv. Funct. Mater. 25, 6287. Guiot, V. et al. (2013) Nat Commun 4, 1722.
[8] Vaju C. et al., Adv. Mat. 2008, 20 : 2760. L. Cario et al., Adv. Mat. 2010, 22 : 5193.
[9] Stoliar P. et al. Adv. Funct. Mater. 27, 1604740(1 (2017).
Practical information
- Expert
- Free
Organizer
- Arnaud Magrez and Raphaël Butté
Contact
- Arnaud Magrez and Raphaël Butté