Introduction to ASML and Recent Developments in Measurement and Metrology

Abstract:
We will give a general introduction on the company ASML, the semiconductor industry and the role of Moore’s law in enabling more computations per time and per energy unit. Moore’s law has been driving ASML’s product portfolio over the past 40 years and will drive ASML’s roadmaps for the next 10-20 years. We will give a view on EUV lithography tools, showcasing the sheer size and complexity of these systems. Finally, we will dive into the world of nanometer measurements, showing the measurement systems inside the lithography tools that enable sub-nm accuracies, and the metrology tools that are stand-alone and that are used to create high volume production systems at industrial speeds and nanometer accuracies.