Colors in thin film materials: from interference in insulators to interstitials in intermetallics
Event details
| Date | 06.10.2014 |
| Hour | 13:15 › 14:15 |
| Speaker | Prof. Ralph Spolenak, ETH Zürich, Department of Materials |
| Location | |
| Category | Conferences - Seminars |
Colors are the first thing we can appreciate about a material, usually before we even touch it or in a more sophisticated manner investigate it microscopically. This talk will investigate how the microstructure, the architecture and the chemistry of a thin film material influences its interaction with photons in the visible energy range. Examples will be given from all materials classes and the phenomena of interference (strong and "weak”) and band structure induced colors will be described. Applications will be given in the biomedical field and although many of the concepts can be related to optics, esthetics and even fraud detection. Briefly, other application-driven properties of coatings will be addressed, which range from fracture toughness over wear resistance, to electrochemical stability. The limits of strength will also be explored in semiconductors and metals.
Papers:
- Applied Physics Letters 103, 213112 (2013); doi: 10.1063/1.4833537
- Nature Materials DOI: 10.1038/NMAT3443
- Acta Materialia 61 (2013) 2874–2883
- CCC 0361 -231 7/07/01 0004-23$04.00 COLOR research and application
Bio: Ralph Spolenak has been promoted to tenured Associate Professor on June 1st, 2010 after a term as Assistant Professor (Tenure Track) and Chair of the Laboratory for Nanometallurgy starting October 1st, 2004. He is currently serving as the chairman of the board of Scientific Center for Optical and Electron Microscopy (ScopeM) .
Prof. Spolenak was born August 17, 1971 in Wels, Austria. He studied physics at the Technical University of Vienna, Austria. After completing his diploma thesis in the field of solid state physics in 1995, and a brief research term at the University of Pavia, Italy, he moved to Stuttgart, Germany, to commence his PhD work at the Max-Planck-Institute for Metals Research and the University of Stuttgart. In 1999 he completed his dissertation on Alloying effects in electromigration and was subsequently awarded the Max Planck Society's Otto Hahn medal for his achievements during his thesis.
In 1999 Prof. Spolenak was hired as a Postdoctoral Member of Technical Staff at Bell Laboratories, Lucent Technologies in the USA. There he was working on the mechanical properties of thin metal films. During this time he became a member of the principal research team to establish the first dedicated Laue microdiffraction beamline at the Advanced Light Source, Lawrence Berkeley National Laboratories. After a year as a visiting scientist at Lehigh University in Pennsylvania, he returned to the Max-Planck-Institute in 2002 to serve as a group leader in the department of Prof. E. Arzt.
The main research interests of Prof. Spolenak's group are the mechanical properties of metals at the nanoscale and how these properties can be influenced by metallurgical approaches. The combination of testing, characterization and modeling are essential for making significant advances in this field. This comprises the development of new, mostly synchrotron based, in situ testing methods that allow for analysis at the nanoscale.
Papers:
- Applied Physics Letters 103, 213112 (2013); doi: 10.1063/1.4833537
- Nature Materials DOI: 10.1038/NMAT3443
- Acta Materialia 61 (2013) 2874–2883
- CCC 0361 -231 7/07/01 0004-23$04.00 COLOR research and application
Bio: Ralph Spolenak has been promoted to tenured Associate Professor on June 1st, 2010 after a term as Assistant Professor (Tenure Track) and Chair of the Laboratory for Nanometallurgy starting October 1st, 2004. He is currently serving as the chairman of the board of Scientific Center for Optical and Electron Microscopy (ScopeM) .
Prof. Spolenak was born August 17, 1971 in Wels, Austria. He studied physics at the Technical University of Vienna, Austria. After completing his diploma thesis in the field of solid state physics in 1995, and a brief research term at the University of Pavia, Italy, he moved to Stuttgart, Germany, to commence his PhD work at the Max-Planck-Institute for Metals Research and the University of Stuttgart. In 1999 he completed his dissertation on Alloying effects in electromigration and was subsequently awarded the Max Planck Society's Otto Hahn medal for his achievements during his thesis.
In 1999 Prof. Spolenak was hired as a Postdoctoral Member of Technical Staff at Bell Laboratories, Lucent Technologies in the USA. There he was working on the mechanical properties of thin metal films. During this time he became a member of the principal research team to establish the first dedicated Laue microdiffraction beamline at the Advanced Light Source, Lawrence Berkeley National Laboratories. After a year as a visiting scientist at Lehigh University in Pennsylvania, he returned to the Max-Planck-Institute in 2002 to serve as a group leader in the department of Prof. E. Arzt.
The main research interests of Prof. Spolenak's group are the mechanical properties of metals at the nanoscale and how these properties can be influenced by metallurgical approaches. The combination of testing, characterization and modeling are essential for making significant advances in this field. This comprises the development of new, mostly synchrotron based, in situ testing methods that allow for analysis at the nanoscale.
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Practical information
- General public
- Free
Organizer
- Holger Frauenrath
Contact
- Holger Frauenrath