NanoFrazor lithography
Event details
| Date | 30.08.2017 |
| Hour | 11:45 › 13:00 |
| Speaker |
Dr. Felix Holzner, CEO and co-founder of SwissLitho AG Bio: Felix Holzner studied physics in New Zealand and Germany and received a PhD from ETH Zurich. In 2009, he joined the Nanofabrication Group at the IBM Research Laboratory in Zurich where he started to work on Thermal Scanning Probe Lithography. After several technological breakthroughs, Felix shortened the name of the technology to “NanoFrazor” and founded SwissLitho in 2012 with the clear vision to enable superior nanofabrication for everyone. He strongly believes that the unique capabilities of the NanoFrazor enable new science and eventually even products not conceivable today. Felix has a complete overview over all possible nanolithography technologies and a very deep understanding of the NanoFrazor technology and its applications. He is a regular invited speaker at international conferences. Felix received the IBM Plateau Invention Achievement Award and the ETH Pioneer Fellowship in 2012 and 2013, respectively. With SwissLitho and the NanoFrazor, he won numerous of the most prestigious startup and technology awards exceeding prize money of 500’000 CHF. In 2013, he was part of the Swiss national startup team in the ventureleaders program in Boston and recently received a scholarship for the Advanced Management Program at the University of St. Gallen (HSG). |
| Location | |
| Category | Conferences - Seminars |
Thermal scanning probe lithography (t-SPL) has recently entered the lithography market as first true alternative or extension to electron
beam lithography (EBL). The first dedicated t-SPL systems, called NanoFrazor, have been installed at research facilities in Europe, America,
Asia and Australia by the company SwissLitho, a spinoff company of ETH Zurich.
Core of the technology - which has its origins at IBM Research and their Millipede project - is a heatable ultra-sharp probe tip which is used
for patterning and simultaneous inspection of complex nanostructures. The heated tip creates arbitrary depth, high-resolution (<10 nm
half-pitch) nanostructures by local evaporation of resist materials. Using an integrated in-situ metrology method, the patterning depth can
be controlled with 1 nm accuracy. This enables patterning of extremely accurate 3D nanostructures in a single step without wet
development. The patterning speed is comparable to high resolution EBL.
The application range for this new nanofabrication capability is broad and will be demonstrated with a selection of examples.
Applications that are enabled by the nm-precise 3D patterning include 3D phase plates and finely tuned coupled Gaussian optical
microcavities. Furthermore, 3D shaped nanofluidic confinements have been used to precisely control the movement of nanoparticles and
nanowires.
The high resolution 2D capability was applied e.g. to shape complex plasmonic structures. Furthermore, several superior nanoelectronic
devices will be shown. Such devices are predominantly made from randomly dispersed nanowires or 2D materials. Therefore, they benefit
strongly from the unique markerless overlay capability of the NanoFrazor lithography, but also from the fact that actually no charged
particle beam is used during lithography, which can often damage sensitive materials.
Finally, a few examples are shown, how the heated tips are also used for direct modification of surfaces by triggering local phase changes
or a chemical reactions.
Practical information
- General public
- Free
Organizer
- Prof. Jürgen Brugger