Online workshop: "Nanoengineering: Lithography and Patterning"

This workshop serves as a platform for interaction and exchange of ideas between members of the Joint Activity ”Nano-Engineering and pattern transfer methods” of NFFA-Europe Pilot (NEP) project and the invited external participants. Its scope includes presentations and discussions of advanced approaches of ultra-high resolution lithography and methods of patterns transfer. Of special interest are nanofabrication techniques that can be used in quantum technologies, but further developments and innovative aspects of generic technologies, such as electron- and ion-beam lithography, scanning probes, self-assembly, etching, deposition, are of interest, too. 

https://www.nffa.eu/news/project-updates/pilot-nep/

Schedule:

• 13.00 – 13.10: Welcome and Introduction
• 13.10 – 13.40: INVITED. Development of Deterministic Ion Implantation for Applications in Quantum Technologies, Daniel Spemann, Paul Räcke et al, Leibniz Institute of Surface Engineering (IOM), Leipzig, Germany 
• 13.40 – 14.00: Silicon Nanowires with Quantum Dot as a Platform for experimentation in Quantum Tecnologies, Jordi Llobet, Francesc Perez-Murano et al, IMB-CNM CSIC, Barcelona, Spain 
• 14.00 – 14.20: Focused beams patterning of metal-oxides synthesized by Polymer Assisted Deposition, Dominique Mailly, Andrea Cattoni, C2N-CNRS, Paris, France 
• 14.20 – 14.30: Break 
• 14.30 – 14.50: Block copolymer lithography for feature reduction and sub-10 nm patterning, Anette Löfstrand et al, Lund University, Lund, Sweden  14.50 – 15.10: Unconventional patterning by nanostencils and thermal scanning probes, Ana Conde-Rubio, Juergen Brugger, et al, EPFL, Lausanne, Switzerland 
• 15.10 – 15.30: Post Treatment Processing for High-Resolution Displacement Talbot Lithography, Ivan Maximov, Reza Jafari Jam et al, Lund University, Lund, Sweden 
• 15.30 – 15.40: Break
• 15.40 – 17.15: Free discussion. Conclusions.