Probe nanopatterning: towards a smarter lithography technology
Event details
| Date | 19.01.2012 |
| Hour | 11:00 |
| Speaker | Dr. Michel Despont, IBM Research - Zurich |
| Location |
MEB010
|
| Category | Conferences - Seminars |
At IBM, we have developed an ML2 technology based on Scanning Probe Lithography (SPL) with in-situ metrology offering a path to a closed-loop lithography concept. It is based on the local evaporation of a resist by using a heated probe. We have demonstrated the potential of the technology by achieving 15-nm half-pitch patterning and, thanks to its metrology capability, a lithography turnaround time that is shorter than that of e-beam lithography. Moreover, owing to its inherent simplicity, the technology is much better adapted to massive parallelization to meet the throughput required for ML2. Finally, the technology opens up new perspectives in nanopatterning as it also allows the patterning of complex 3D nanostructures. In this presentation, Dr. Despont will introduce the lithography landscape and its challenges before describing our probe-patterning method and putting it into perspective with other NGL and SPL technologies. Its unique features open a path toward a smarter way of doing lithography, with greater control of the process, lower cost, higher versatility and new applications.
Practical information
- General public
- Free