Photoresist trimming for the formation of 65-45 nm gate stack within 90 nm design rules
Event details
| Date | 07.10.2016 |
| Hour | 09:00 › 10:30 |
| Location | |
| Category | Conferences - Seminars |
Seminar given by a PhD applicant at EDPY
Practical information
- Expert
- Invitation required
- This event is internal
Organizer
- LND