Photoresist trimming for the formation of 65-45 nm gate stack within 90 nm design rules

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Event details

Date 07.10.2016
Hour 09:0010:30
Location
Category Conferences - Seminars
Seminar given by a PhD applicant at EDPY

Practical information

  • Expert
  • Invitation required
  • This event is internal

Organizer

  • LND

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