Characteristics of SiH4/H2 VHF plasma produced by short gap discharge
Event details
| Date | 02.09.2011 |
| Hour | 14:30 |
| Speaker | Prof. Yoshinobu KAWAI |
| Location |
MT2, Institut de Microtechnique, Rue A.-L. Breguet 2, 2000 Neuchâtel
|
| Category | Conferences - Seminars |
A SiH4/H2 VHF plasmawas producedwith themulti rod electrode and the fundamental plasma parameterswere
examined as a function of pressure and power, where the frequency of the power source was 60 MHz. It was
found that the ion saturation current takes a peak at a certain power as well as pressure. These results were
discussed from the point of view of electron trapping effect in VHF electric fields. In addition, anomalous
reduction of the sheath potential was observed.
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