IMT Talk - Advancing the nanolithography for more Moore and beyond


Event details

Date and time 25.01.2021 13:0014:00  
Place and room
Speaker Dr. Yasin Ekinci
Category Conferences - Seminars

The tremendous shrinkage of the semiconductor devices in the last five decades, as predicted by Moore’s law, has changed our daily lives. This progress was possible through advancements in photolithography and optical metrology. Extreme ultraviolet (EUV) lithography at 13.5 nm wavelength is the manufacturing method for high-volume semiconductor manufacturing at 7 nm technology node and below. To enable future progress, many challenges lie ahead. In my talk, I discuss the challenges of nanolithography with specific examples. Moreover, it is evident that the progress of classical computing will come to an end, and therefore, we need a paradigm change. Fortunately, quantum computing is emerging as a technology that will ensure progress in computing beyond Moore’s law. I will talk about the lithographic challenges  of quantum computing and present our ongoing work to address these.

Yasin Ekinci is the head of the Laboratory for Micro and Nanotechnology (LMN). He also heads the Advanced Lithography and Metrology Group at Paul Scherrer Institute. He received his Bachelor's degree in Physics at Middle East Technical University, Ankara, Turkey, in 1997; his Master's degree in Engineering Sciences at the University of De Montfort, Leicester, UK, in 1999. He obtained his Ph.D. in Max-Planck Institute for Dynamics and Self-Organization, Göttingen, Germany, in 2003. In 2004, he joined Paul Scherrer Institute as a postdoctoral researcher. Between 2006 and 2012, he worked as a postdoctoral researcher and subsequently as a senior scientist and a lecturer in the Department of Materials at ETH Zürich. Since 2009, he works at PSI as a senior scientist, and in 2016 he was appointed as the head of the Advanced Lithography and Metrology group. Since 2018, he is the acting head of the Laboratory for Micro and Nanotechnology.

He worked on various topics of nanoscience and technology, including atom optics, surface science, EUV lithography, resist materials, coherent scattering, lensless imaging, plasmonics, metamaterials, biosensing, semiconductor nanostructures, and nanofluidics. He is author/co-author of more than 200 papers, 3 book chapters, and 7 patent applications. He received Young investigator of the year award of Swiss Society for Optics and Microscopy in 2009. He is a fellow of SPIE.

Practical information

  • Informed public
  • Free
  • This event is internal


  • Institute of Microengineering