Study on the PECVD deposited amorphous and nanostructured silicon carbon films
Event details
| Date | 19.06.2009 |
| Hour | 11:00 |
| Speaker | Dr K Basa |
| Location |
IMT Neuchâtel, PVLAB, Breguet 2 / Salle MT2 11.00-12.00
|
| Category | Conferences - Seminars |
ABSTRACT
Amorphous and nanostructured silicon carbon films have generated considerable interest both fundamentally and technologically because of their current and future applications in microelectronic and optoelectronic devices.Although interesting class of materials such as amorphous, microcrystalline and nanocrystalline materials have been deposited using PECVD technique under suitable preparation conditions, the interesting issues like microstructural and overall disorder, chemical ordering, medium range ordering as well as microcrystalline to nanocrystalline phase transition have not been well studied.In the present talk I will summarize the interesting results obtained from our study on PECVD deposited amorphous and nanostructured silicon carbon films concerning these issues.
Links
Practical information
- General public
- Free
Contact
- Mary-Claude Gauteaub