2019 Advanced Course: Introduction to scanning electron microscopy microanalysis techniques
Event details
Date | 11.12.2019 › 13.12.2019 |
Hour | 08:00 › 17:00 |
Speaker | Dr. Xavier Maeder; Dr. Johann Michler |
Category | Internal trainings |
Scanning electron microscopes (SEMs) are the Swiss Army knives of materials analysis instruments. Modern SEMs in particular, when combined with focused ion beams (Dual beam FIBs), provide a larger number of multimodal imaging and different analytical methods.
Objectives
The course format consists of introductory lectures in the morning, and then lectures on advanced techniques and practical work in the afternoon in front of SEMs. The following subjects will be presented during the course:
– Basics of the scanning electron microscopy and focused ion beam instruments (construction principles, signals, interaction with the sample)
– Advanced imaging modes: STEM, low tension microscopy, high vacuum, ion channeling
– Advanced microstructure investigation with EBSD and transmission EBSD orientation mapping (EBSD strain and stress analyses with cross correlation technique)
– Chemical analyses with EDS, WDS and μ-XRF
– Chemical depth profile with FIB-TOF-SIMS
– Raman spectrometry for phase and strain/stress analyses
The techniques will be explored in small groups on real samples in front of SEMs. Full details can be found on the course website.
Target audience and registration
This course is open to participants with a basic background in materials science, mechanical engineering, chemical engineering, micro-technology or physics and is targeted towards both industrial and academic users of analytical SEMs. The course may be validated for 1 ECTS credit in the doctoral programmes of EPFL and ETH Zurich, after acceptance by the corresponding institution. In this case, full attendance and a final examination after the end of the course on the final day is required.
Links
Practical information
- Informed public
- Registration required