The Extension of CMOS Technology Beyond 14 nm Node
Event details
| Date | 15.11.2013 |
| Hour | 14:15 |
| Speaker | Dr. Christophe P. Rossel, IBM Research-Zurich, Rüschlikon |
| Location | |
| Category | Conferences - Seminars |
The advances in Si technology have been the backbone of a tremendous growth in the semiconductor industry as described by Moore's law. As there are ultimate limits to transistor scaling, new materials and innovative concepts are needed to extend CMOS technology as far as possible and even beyond traditional schemes. One goal at IBM Zurich in the field of advanced function materials is the development of high-mobility channel MOSFETs based on III-V materials such as InGaAs with advanced gate stack using high-k dielectrics, and their co- integration on Si wafers. The different materials and integration issues and solutions will be reviewed.
Practical information
- Informed public
- Free
Organizer
- ICMP (Arnaud Magrez and Raphaël Butté)
Contact
- Arnaud Magrez